AP0853 Structural, Optical and Morphological Characteristics of Laser-Treated Graphene Layers Grown on Silicon Substrates by Spin Coating

Abstract

This study examined effect of pulsed laser on graphene deposited on silicon substrates of n- and p-type. XRD pattern reveals a hexagonal structure with a high degree of crystallization and a diffraction peak at 26°. The dominating growth direction of graphene is (002). This result, confirmed the decrease in graphene density after treatment. FESEM images of the samples appear as flakes or wrinkled sheets and nano-sized particles. The removal of many graphene layers was observed in both types, wrinkled flakes appear in smooth layers evenly distributed over the surface. For samples deposited on n-type, the particle size dropped from 78 to 54 nm, and on p-type, it reduced from 98 to 66 nm. FTIR spectra showed vibrational groups including carbon=carbon (C=C) at the absorption peak of 1630 cm, the carbonyl (C=O) groups at 1695.43-1705.07 cm-1. The energy gap decreases after laser treatment. These results are important for optoelectronic devices.