Photosensitivity of Nb2O5/Si Thin Films Produced via DC Reactive Sputtering at Different Substrate Temperatures. Iraqi Journal of Applied Physics, [S. l.], v. 20, n. 2B, p. 349–356, 2024. DOI: 10.2025/vsz9v732. Disponível em: https://ijap-iq.com/index.php/ijap/article/view/45. Acesso em: 27 mar. 2026.