Effect of Annealing Time on Physical Properties of TiO2 Thin Films Prepared by RF Magnetron Sputtering Technique. Iraqi Journal of Applied Physics, [S. l.], v. 20, n. 1, p. 37–42, 2026. DOI: 10.2026/kq4kgf11. Disponível em: https://ijap-iq.com/index.php/ijap/article/view/777. Acesso em: 5 sep. 2026.