Optoelectronic Characteristics of Al2O3/Si Multilayer Structures Fabricated by DC Reactive Sputtering Technique. Iraqi Journal of Applied Physics, [S. l.], v. 22, n. 2, p. 153–158, 2026. DOI: 10.2025/xmbfxa15. Disponível em: https://ijap-iq.com/index.php/ijap/article/view/479. Acesso em: 9 apr. 2026.