Characterization of Aluminum-Doped Titanium Dioxide Thin Films Prepared by Pulsed-Laser Deposition

Abstract

In this research , thin films of pure titanium oxide  doped with  aluminum ratios of (2,4)% have annealed after they  have deposited on glass substrates , using the pulsed laser deposition  method . tests showed the appearance of clear peak for titanium oxide (103) corresponding to the angle 2Ɵ=(36.91o). The crystalline structure of the TiO₂ films is Monoclinic . The results of the atomic force microscope  showed a degradation in the grain size of pure and doped films as a responsibility for annealing, which led to an dgradatione in the surface roughness. SEM images also showed of pure titanium dioxide films inlaid with (Al). It revealed a very homogeneous distribution of atoms with agglomeration to appear as clusters of scattered grains that resemble clusters of grapes in structure.  Also the energy gap has decreased in its values  from 3.47eV- to 3.36eV.