Effect of Argon:Oxygen Gas Mixing Ratio on Characteristics of Silicon Dioxide Nanoparticles Synthesized by DC Reactive Sputtering

Abstract

In this work, nanostructured SiO₂ thin films were deposited on glass substrates using DC reactive magnetron sputtering technique. Gas mixtures of argon and oxygen at different mixing ratios were used to synthesize SiO₂ nanoparticles. A transition from amorphous to partially crystalline phases was revealed as the oxygen ratio increased, indicating enhanced crystallinity under oxygen-rich conditions. The morphology of the film surface varied and the particle size decreased with higher oxygen content, suggesting improved oxidation and limited grain growth. The results confirm that the Ar:O₂ gas ratio plays a critical role in tuning the structural and optical properties of SiO₂ nanostructured thin films.